Spineology Inc. specializes in innovative spinal implant technologies, with its flagship product being the OptiMesh® system. This unique implant is designed to conform to the individual anatomy of patients, featuring a proprietary Conform and Expand™ technology that allows it to adapt to various endplate morphologies. The OptiMesh implant is delivered through a minimally invasive insertion profile, which not only enhances surgical efficiency but also maximizes the implant's footprint. This adaptability is crucial for achieving optimal alignment and restoring disc height, thereby promoting effective spinal fusion. The implant is primarily composed of biologics, which facilitates the efficient delivery of biologics to the spine, making it a comprehensive fusion scaffold.

The clinical validation of OptiMesh is underscored by its IDE De Novo level grant and the results from the Spineology Clinical Outcomes Trial (SCOUT Study). The data indicates high patient satisfaction rates, significant improvements in back pain and function, and a low incidence of serious adverse events. With over 50,000 implants and more than 20 years of clinical experience, OptiMesh stands out in the interbody fusion market. Its versatility allows it to be utilized across various surgical approaches, including open, minimally invasive, and endoscopic techniques, making it a valuable tool for spine surgeons aiming to enhance patient outcomes while minimizing surgical morbidity.

United States

Spineology's OptiMesh is the only conforming, patient specific lumbar expandable implant on the market. OptiMesh is delivered through the smallest insertion profile, dynamically conforms to a patient’s unique endplate morphology, and powerfully expands to one of the largest implant footprints available.
 
Spineology’s OptiMesh features our unique Conform and Expand™ technology, enabling a custom anatomical fit for lumbar fusion surgical patients. OptiMesh is designed to overcome the challenges of static and mechanically expandable implants.

Spineology Inc.

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